ADEKA : Expands Production Capacity for Photoacid Generators Used in Advanced Photoresists for EUV Lithography- Responding to Strong EUV Demand and Accelerating PAG Monomer Scale-Up

Published August 20, 2026 at 6:14 a.m. UTC

Source: MarketScreener

Aug. 20, 2026 ADEKA Corporation hereby announces its decision to expand production capacity for photoacid generators (PAG) used in semiconductor photoresists for advanced semiconductor lithography processes, including extreme ultraviolet (EUV) lithography. The Company will add a new production line within an existing building at its Chiba Plant (Sodegaura City, Chiba Prefecture), with commercial operation scheduled to commence in September 2028. [...]

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