Toray Industries, Inc. TSE:3402
Toray Industries : R&D of Toray Group’s Water Treatment Business and Separation Membrane
Source: MarketScreener
TORAY IR Seminar
R&D of Toray Group's
Water Treatment Business and Separation Membrane
March 28, 2025
Yuichiro Iguchi
Corporate Vice President
General Manager of Research Division,
Toray Industries, Inc.
Contents
I. R&D Efforts in Water Treatment Business
II. New Development of Separation Membrane Technology
III. Future Perspectives
R&D Structure
HS Division
Collaboration between business and technical departments and research
Manufacturing
Division
Production-Related Jobsite
Technology-Related Jobsite
Electronic Information Materials Division
Pharmaceuticals & Medical Products Division
Water Treatment & Environment Division
Affiliated Business Group
and Others
Technology Center
(Seamless technology development function)
Research Division
Division's research (new product development)
Research to strengthen business foundations
Head office research
Research aimed at creating a future
Promote divisional research that is integrated with each business division, as well as head office research that looks ahead to the future from a business and company-wide perspective
3
Toray's separation membrane-related products and technologies
Toray's Membrane-Related Business
R&D Strategies of RO Membranes
1. Promote steady technological development to realize a stable water supply
(1) Expand market share of seawater desalination
(2) Expand RO membrane business for brackish water
2. Promote upfront development, aiming for expansion in growth areas
(1) Ultrapure water for semiconductors
(2) Wastewater reuse
R&D Strategy
Total cost reduction through durability and water permeability improvement
Develop new products that contribute to the reduction of the use of chemicals and electricity
Progress of RO Membrane: Strengths of Our Membrane
(Test results in actual plants)
Formation of strong membrane structure (Difficult to dissolve by chemicals)
Comparison of performance after repeated cleaning using acid and alkali
Next Target
membrane 2024 new product
High durability
Progress of RO Membrane: High-function Products for the Semiconductor Field
Impurities | Ion (Na+, SO42-, etc.) | Neutral molecule (silica, boron, urea) |
Removal Mechanism | Separating functional layer (polyamide) Charge repulsion + pore size | Pore size only Difficulty in removal Radius (nm) 0.14 0.23 0.25 0.36 Water Urea H2O Boron Silica CO(NH2)2 B(OH)3 SiO 2 Membrane structure design by analysis x film production technology AI Fewer Pores RO pore structure small← Pore size → large |
Water production [m3/day]
Silica Removal Rate [%]
99.4
100
99.8
99.2
99.5
99.0
Development in the next generation | |
High silica removal membrane (TBW-HR) | Energy-saving (Under development) |
2-fold removal property Performance zone of conventional membranes (including other companies' products) |
Progress of RO Membrane: New Development for the Semiconductor Field
Ultrapure water for semiconductors
High urea removal membrane
• Consideration for utilization of recycled wastewater is proceeded in response to water source shortage
• Sewage-derived urea generates ammonia by hydrolysis
Exposure
NH3
NH3
H+ H+ | H+ | H+ |
NH3Mask Acid deactivation
Resist
+
(neutralization)
• Adversely affect resist performance e.g., Pattern defect
Photosensitive inhibition
75
High urea removal membrane Launched in 2024 (TBW-XHR) (energy-saving type) Next target |
2-fold removal property
Performance zone of conventional membranes (including other companies' products) |
95
Urea Removal Rate [%]
90
85
80
70 20
25
30
35
Water production [m3/day]
40
45
Substrate
NH3
Launch of high urea removal membrane to contribute to the issue of water source shortage in the semiconductor field