Asml Holding Nv · EURONEXT:ASML

Asml Holding Nv — TMT Conference 2011 – Bank of America

30 slides from Asml Holding Nv's conference presentation, Jun 7, 2011

  1. Slide 1: TMT Conference 2011 – Bank of America

    Exhibit 99.1 TMT Conference 2011 – Bank of America London Franki D’Hoore, Director European Investor Relations June 7, 2011

  2. Slide 2: Safe Harbor

    Safe Harbor "Safe Harbor" Statement under the US Private Securities Litigation Reform Act of 1995: the matters discussed in this document may include forward-looking statements, including statements made about our outlook, realization of backlog, IC unit demand, financial results, average selling pr

  3. Slide 3: ASML Headquarters in Veldhoven, the Netherlands

    ASML Headquarters in Veldhoven, the Netherlands ASML: the number 2 semiconductor equipment supplier in the world in 2010

  4. Slide 4: Agenda

    Agenda Business Overview Market ASML EUV update Outlook and summary

  5. Slide 5: Business Overview

    Business Overview

  6. Slide 6: Total net sales M€ by quarter, 2006-2011

    629 949 919 183 742 1,452 942 930 844 277 1,069 958 934 697 555 1,176 1,053 955 494 581 1,521 1,000 2,000 3,000 4,000 5,000 6,000 2006 2007 2008 2009 2010 2011 Q4 Q3 Q2 Q1 Total net sales M€ 3,582 3,768 Numbers have been rounded for readers’ convenience. 2,954 1,596 4,508

  7. Slide 7: Q1 results - highlights

    Q1 results - highlights Net sales of € 1,452 million, 63 systems shipped valued at € 1,284 million, service and field option sales at € 168 million Gross margin of 44.7% Operating margin of 31.0% Net system bookings of 40 systems, € 845 million Backlog at € 3,330 million, 134 systems with ASP of € 2

  8. Slide 8: Key financial trends 2010 – 2011

    Key financial trends 2010 – 2011 Consolidated statements of operations M€ Q1 10 Q2 10 Q3 10 Q4 10 Q1 11 Net Sales 1,069 1,176 1,521 1,452 Gross profit Gross margin % 40.3% 43.0% 43.6% 45.0% 44.7% R&D costs SG&A costs Income from operations Operating income % 18.5% 27.4% 27.9% 32.4% 31.0% Net income

  9. Slide 9: Backlog in value per March 27, 2011

    Backlog in value per March 27, 2011 Numbers have been rounded for readers’ convenience.

  10. Slide 10: Market

    Market

  11. Slide 11: Business environment

    Business environment Semiconductor manufacturers have shown caution in assessing economic impact of Japanese earthquake on their supply chain and end-product markets Although direct impact to the electronics industry world- wide seems limited, it has caused some of our customers to review their exis

  12. Slide 12: 3mma IC revenue, inventory and inventory days

    3mma IC revenue, inventory and inventory days - 3mma IC inventory value (left) 3mma IC revenues (left) 3mma IC consumption: revenues ± inventory value change (left) 3mma Inventory days (right) Consumption decreased in March, whereas revenues increased, causing growing IC inventory level Source: VLSI

  13. Slide 13: DRAM

    DRAM Source: DRAMeXchange (5/5/2011), ASML MCC Further recovery of contract prices leads tier manufacturers at low 5x nm (closer) to profitability <Customer litho system utilizations high>

  14. Slide 14: NAND

    NAND SLC spot prices slide after change in product mix in March, overall chip prices remain quite stable at healthy levels <Customer litho tool utilization remain high> Source: DRAMeXchange (5/5/2011), ASML MCC

  15. Slide 15: ASML EUV update

    ASML EUV update

  16. Slide 16: Technology - EUV

    Technology - EUV NXE:3100 second generation EUV Three NXE:3100 shipped to date, 3 more to go Progress ongoing to reach target throughput by year end Customer process development started Infrastructure development transitioning to optimization phase (masks, resist, metrology, etc) Revenue recognition

  17. Slide 17: Why EUV? EUV supports IC & Lithography roadmap towards <10nm

    Why EUV? EUV supports IC & Lithography roadmap towards <10nm Year of production start Notes: 1. R&D solution required 1.5~ 2 yrs ahead of Production 2. EUV resolution requires 7nm diffusion length resist 3. DPT = Double Patterning 4. QPT = Double Double Patterning Source: Customers, ASML

  18. Slide 18: Consumers are the winners

    Consumers are the winners Shrink drives manufacturing cost down Note: data iSupply, March 2009. High quality Flash

  19. Slide 19: Shrink drives device complexity which drives litho opportunity

    Shrink drives device complexity which drives litho opportunity due to a growing number of critical litho layers Source: ASML Marketing (03/11), 300mm wafers only

  20. Slide 20: Increasing immersion layers per node, per year with shrink in memory too

    Increasing immersion layers per node, per year with shrink in memory too Source: ASML Marketing (03/11), 300mm wafers only

  21. Slide 21: Typical Patterning Schemes for Critical Layers

    Typical Patterning Schemes for Critical Layers DPT = Double Patterning Source: ASML Strategic Marketing

  22. Slide 22: EUV lowers overall costs for customer, while increasing litho costs

    EUV lowers overall costs for customer, while increasing litho costs * Source: ASML Strategic Marketing; Cost of Technology model incl. Capex & Opex – NAND Example Cost per layer [Euro/Wafer]

  23. Slide 23: ASML's Unique Holistic Litho Optimisation & Control

    ASML’s Unique Holistic Litho Optimisation & Control of future low k1, DP and EUV litho processes

  24. Slide 24: ASML's unique Holistic Litho optimisation & control

    ASML’s unique Holistic Litho optimisation & control of future low k1, DP and EUV litho processes

  25. Slide 25: Holistic Litho creating value

    Holistic Litho creating value Customers: Improved chip yield capability and cycle time improvement for semiconductors made with advanced litho process like low k1, double pattering and EUV ASML: Holistic products sold with new machines or added to existing tools in customers factories result in High

  26. Slide 26: Section Summary

    Section Summary Low k1 Double Patterning Lithography enables extension of immersion Lithography bridging the gap until single patterning EUV is available However, Double Patterning presents significant Cost, Process Control, and Cycle Time manufacturing challenges Advanced Optical Metrology enables

  27. Slide 27: Outlook and summary

    Outlook and summary

  28. Slide 28: Q2 2011 outlook

    Q2 2011 outlook Order intake between € 900 million – €1 billion Net sales around € 1.5 billion Gross margin about 45% R&D at € 150 million SG&A at € 55 million ASML expects 2011 total revenue clearly above € 5 billion

  29. Slide 29: Cash return

    Cash return € 2.7B cash & cash equivalents at end Q1 2011 € 1 B / 24 month share buy back program in progress 25% of program executed until wk 21 7 million shares repurchased at an average price of € 29.42 Weekly updates available on ASML’s website Dividend for 2010 of € 0.40 per ordinary share (app

  30. Slide 30: Slide 30

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