Slide 1: The next generation of wafer stages
The next generation of wafer stages Frank van de Mast and Harry van der Schoot 15 October 2008, Veldhoven
Slide 2: Wafer stage performance is crucial
WAFER Next Slide Wafer stage performance is crucial Wafer stage performance is crucial
Slide 3: Higher throughput due to faster acceleration
Higher throughput due to faster acceleration time speed a - - a ^t t a - - a t TWINSCAN XT TWINSCAN NXT speed time
Slide 4: ASML wafer stage drivers
ASML wafer stage drivers Productivity - speed/acceleration - performance wafer stage Initial throughput improvement of more than 30% Overlay - accuracy - measurement system New measurement system to position wafer more accurately overlay improvement by 50% Resolution - Focus point Lens Shrink improv
Slide 5: Performance
Performance
Slide 6: NXT Wafer Stage Improves Throughput and Overlay
NXT Wafer Stage Improves Throughput and Overlay Goal Design Reduce Exposure Time Higher Acceleration Light-Weight Construction Reduce Exposure Time Higher Acceleration New Actuators for high force Reduce Overhead Very Fast Chuck Swap Autonomous chucks during swap Reduce Overhead Seamless Immersion S
Slide 7: Sequential versus parallel operation
sequential operation Parallel operation reduced time needed per wafer Productivity increase Time needed to expose a single 300 mm wafer ^ scan time step time wafer load + global + fine align metrology operation parallel operation wafer exposure operation scan time wafer measurement + align step time
Slide 8: Performance: 'Journey of a wafer' on dual wafer stages
stage swap stage swap stage swap Performance: 'Journey of a wafer' on dual wafer stages align reticle expose position measurement position align wafer expose wafer load wafer unload wafer measure wafer
Slide 9: Accuracy
Accuracy
Slide 10: What does overlay mean?
What does overlay mean? Overlay up to 2 nanometers 1 nm = 4 silicon atoms
Slide 11: Wafer stage metrology impact on overlay
Wafer stage metrology impact on overlay Inter- ferometer 300 mm stage Current stage metrology X-coordinate Y- coordinate Overlay [nm, 99.7%] Overlay: < 2 nm Wafer [#] (prototype) 0 2 4 6 8 10 1 2 3 4 5 6 7 8 9 10 11 Overlay: < 4 nm System [#] (ArF 0.93NA) 0 2 4 6 8 10 1 2 3 4 5 6 7 8 9 10 11 Overlay
Slide 12: Conclusion
Conclusion The NXT TWINSCAN platform offers opportunities to significantly improve overlay and productivity. Overlay The new wafer stage is suitable for double patterning techniques which manufacturers need for 32 nm node and beyond. Productivity The platform makes it possible to continue the semico