Ichor Holdings · NASDAQ:ICHR
Ichor — Technical Presentation (2022)
18 slides from Ichor's technical presentation, 2022
Slide 1: Modeling and Characterizing the Performance of Fluid Mixing Components
Modeling and Characterizing the Performance of Fluid Mixing Components in Single-Wafer Wet Processing Equipment for Nanoscale Semiconductor Device Fabrication Gary Xing, Michael Vogtmann, Randy Treur, Phil Barros, Paul Werbaneth Ichor Systems Inc Confidential 1
Slide 2: Table of Content
SEMICON KOREA 2022 Table of Content • Ichor introduction • Study background • CFD introduction/governing equations • Performance metrics/key assumptions/study parameters • Results and mathematical modeling • Conclusion and Discussion Confidential 2
Slide 3: Ichor Overview
SEMICON KOREA 2022 Ichor Overview World’s Leading Provider of Critical Fluid Delivery Subsystems and Components for Semiconductor Capital Equipment • Gas and chemical delivery subsystems are key elements of process tools used in the manufacturing of semiconductor devices • Over 20 years of operation
Slide 4: Wafer Yield Management from Reactive to Proactive Approach
SEMICON KOREA 2022 Wafer Yield Management from Reactive to Proactive Approach Good Better Best Proactive study of process Perform post-process root Association of spatial patterns parameters, fluid properties and cause analysis for the detected to WIP process step and mechanical geometry to spatial
Slide 5: Mixing Performance Direct Impact on Etch Length Uniformity
SEMICON KOREA 2022 Mixing Performance Direct Impact on Etch Length Uniformity • Typical semiconductor wet etching process requires accurate and precise acid concentration to produce desired and consistent etch length Single channel etch length Variation Etch length pattern in Variation ~ 50A horizon
Slide 6: Mixing Schematics and Key Performance Metric
SEMICON KOREA 2022 Mixing Schematics and Key Performance Metric 𝑛 𝑖=1 𝐶𝑖 ∗ 𝑄𝑖 C – concentration/mass fraction • It is desired to reduce piping between 𝐶𝑚𝑖𝑥𝑒𝑑 = 𝑛 𝑖=1 𝑄𝑖 Q – volumetric flow rate mixer outlet and dispense surface in Good mixing, equipment optimization. Therefore, low…
Slide 7: CFD Introduction/Governing Equations
SEMICON KOREA 2022 CFD Introduction/Governing Equations • Computational Fluid Dynamics (CFD) is a branch of fluid mechanics that uses numerical analysis and data structure to analyze and solve problems that involve fluid flows • Ichor uses SOLIDWORKS® Flow Simulation to analyze transient and steady-
Slide 8: Design of Experiment and Key Assumptions
SEMICON KOREA 2022 Design of Experiment and Key Assumptions • Ichor studies and models CoV over parameters: - Various combinations of fluids - Mixing water with chemical with different density, viscosity, etc. Thermal Heat Density, - Mixing element geometries Fluid Viscosity, Pa.s Conductivity, Capa
Slide 9: CoV vs. Total Flow Rate, Viscosity, Mixer vs. No Mixer
SEMICON KOREA 2022 CoV vs. Total Flow Rate,Viscosity, Mixer vs. No Mixer No mixing element • Dilution factor = 5 Mixer Geometry A - 1:4 vol. ratio, Chemical: H2O • Lower CoV, better uniformity - With mixing element Mixing Uniformity, CoV 49% HF (µ = 0.0005Pa.s) 96% H2SO4 (µ = 0.07849Pa.s) Dilution F
Slide 10: CoV = f(Q, µ, Cchem), Mixer A vs. Mixer B vs. No Mixer
SEMICON KOREA 2022 CoV = f(Q, µ, Cchem), Mixer A vs. Mixer B vs. No Mixer µ = 0.0005Pa.s µ = 0.0012Pa.s µ = 0.0494Pa.s µ = 0.0785Pa.s No mixing element • Polynomial linear fit of CoV Mixer Geometry A against viscosity, flow rate DF = 2.5 Mixer Geometry B and dilution factor (target mass fraction) DF
Slide 11: CoV = f(Q, µ, Cchem)
SEMICON KOREA 2022 CoV = f(Q, µ, Cchem), µ = 0.0005Pa.s µ = 0.0012Pa.s µ = 0.0494Pa.s µ = 0.0785Pa.s Mixer Geometry A • Mixing geometry designed Mixer Geometry C, designed for low flow application specifically for low flow DF = 2.5 application DF =5 Mixing Uniformity, CoV DF = 7.5 DF = 10 Total Flow
Slide 12: Sample Model Fit
SEMICON KOREA 2022 Sample Model Fit CoV - Data • Low P value and VIF indicate that parameters are statistically significant with no co-linearity CoV - Predicted • Model fit with high R-square and low RSME • Mixing uniformity is most sensitive to chemical viscosity, followed by dilution factor and to
Slide 13: Model R-square and RSME by Mixer Geometry
SEMICON KOREA 2022 R-square RSME • Different mixer geometries are modeled up to No Mixer Lack of fit certain extent to avoid overfitting Mixing Geometry A 0.83 0.0107 - R-square and RSME can be further improved Mixing Geometry B 0.92 0.0142 however, requires higher degree polynomial and complicated
Slide 14: Differential Pressure = f(Q, µ, Cchem, Mixer Geometry)
SEMICON KOREA 2022 Differential Pressure (psi) = f(Q, µ, Cchem, Mixer Geometry) Mixer Geometry A • Pressure drop across mixer Mixer Geometry B also considered with different design in addition 49% HF (µ = 0.0005Pa.s) Dilution Factor = 2.5 100% H2O2 (µ = 0.0012Pa.s) Dilution Factor = 2.5 to mixing un
Slide 15: Residence Time Impact
SEMICON KOREA 2022 Residence Time Impact Mixer Geometry A • For application that has low supply pressure, Ichor offers Mixer Geometry B Mixer Geometry B + additional length the option of low pressure dP_Stream_H2O, psi 49% HF (µ = 0.0005Pa.s) 100% H2O2 (µ = 0.0012Pa.s) Dilution Factor = 2.5 Dilution
Slide 16: Conclusions/Discussions
SEMICON KOREA 2022 Conclusions/Discussions • Proactive approaches to characterize process performance, predict wafer spatial pattern, and select equipment design tailored for specific applications is critical in the evolving and ever-demanding semiconductor industry. • While conventional single poin
Slide 17: Future Works
SEMICON KOREA 2022 Future Works • Ichor Systems Inc. continues mixer development Design Prototype cycle to generate data-driven design, improve understanding of process performance and Application case studies Manufacture CFD simulations and modeling parameter correlations, and manufacture Robust te
Slide 18: SEMICON KOREA 2022
SEMICON KOREA 2022 Confidential 18