Screen Holdings Co., Ltd · TSE:7735
Screen — SOKUDO Breakfast (July 2011)
14 slides from Screen's conference presentation, Jul 13, 2011
Slide 1: Lithography Industry Collaborations
Accelerating the next technology revolution Lithography Industry Collaborations SOKUDO Breakfast July 13, 2011 Stefan Wurm SEMATECH Copyright ©2009 SEMATECH, Inc. SEMATECH, and the SEMATECH logo are registered servicemarks of SEMATECH, Inc. International SEMATECH Manufacturing Initiative, ISMI, Adva
Slide 2: Outline
Outline • Drivers of collaboration in lithography • Collaboration at consortia • Outlook 21 July 2011 2
Slide 3: Lithography scaling challenges drive collaboration
Lithography scaling challenges drive collaboration 21 July 2011 3
Slide 4: The challenges of infrastructure development drive collaboration
The challenges of infrastructure development drive collaboration • Developing A lithography the technology materials will be introduced and into tools technology manufacturing only infrastructure for ifa all new of the supporting technology lithography: infrastructure is available Takes many years t
Slide 5: Transition challenges drive collaboration
Transition challenges drive collaboration • The costs of lithography scaling and technology transitions keeps increasing • Fewer materials and tool suppliers can afford the up-front investments needed to keep pace • The industry is facing unique transition challenges – Must meet a technology challen
Slide 6: SEMATECH and ISMI - worldwide collaboration is our business
SEMATECH and ISMI - worldwide collaboration is our business 21 July 2011 6
Slide 7: SEMATECH evolution
SEMATECH evolution Increasing collaboration throughout supply chain Contributions Directions • Helped stabilize US based players • US only to global consortium • 300mm wafer size transition • Greater manufacturing focus • Mfg. productivity improvements • Supplier participation • Infrastructure for n
Slide 8: Consortia lithography collaborations enable early tools and tool access
Consortia lithography collaborations enable early tools and tool access Mask tool availability for pilot lines Tool access for early materials start & technology ramp-up development & process learning • SEMATECH • SEMATECH – 65 nm node mask repair (FEI) – 157 nm MET (Exitech) – 157 nm AIMS (Carl Zei
Slide 9: EUV Lithography is a game changer for collaboration approaches
EUV Lithography is a game changer for collaboration approaches • EUV exposure tool infrastructure for materials development is very costly and requires unique expertise – SEMATECHs Resist and Materials Development Center (RMDC) offers a collaborative industry environment to help enable the developme
Slide 10: SEMATECH's Resist and Materials Development Center (RMDC)
SEMATECH’s Resist and Materials Development Center (RMDC) • Provides world-class EUV imaging capabilities to participating companies and organizations – it is an open participation model • 24/7 operation, support for member company experimental plans, and an EUV research effort concentrating on nove
Slide 11: SEMATECH's Mask Blank Development Center (MBDC)
SEMATECH’s Mask Blank Development Center (MBDC) • State of the art tool set and advanced analytical capabilities to enable defect learning and defect reduction • Provides collaborative industry environment for participants to prepare for EUV mask blank production Blank defect caused Blank defect cau
Slide 12: SEMATECH EUV Mask Infrastructure (EMI) Partnership – a new industry model
SEMATECH EUV Mask Infrastructure (EMI) Partnership – a new industry model Suppliers Building Solution? HVM Solution Funded? Time to HVM Gap Solution Before EMI After EMI Before EMI After EMI Mask Blank Funded by Japanese Actinic Inspection No Yes (1 supplier) No Consortium (EIDEC) 2013 Mask Defect F
Slide 13: An outlook on collaboration
An outlook on collaboration • Lithography infrastructure development will see more collaboration going forward and not less – Cost, complexity, and the risk associated with major technology transitions in the industry drive collaboration • Collaboration on infrastructure development and pre- competi
Slide 14: Accelerating the next technology revolution
Accelerating the next technology revolution Research Development Manufacturing 21 July 2011 14