Suss Microtec Se · XETR:SMHN

Suss Microtec — Investor Day (2025)

23 slides from Suss Microtec's investor day presentation, 2025

  1. Slide 1: Business Unit Photomask Solutions (Yuta Nagai)

    Business Unit Photomask Solutions (Yuta Nagai) Public | SUSS Capital Markets Day 2025 1

  2. Slide 2: Agenda

    Agenda 01 Market Outlook 02 Vision & Strategy 03 Financial Highlights 04 Summary Public | SUSS Capital Markets Day 2025

  3. Slide 3: Synergies with Corporate Strategy and Our Strategic Role

    Synergies with Corporate Strategy and Our Strategic Role Building the Foundation for Growth Across Front-End and Back-End As Moore’s Law continues to be extended, the demand Photomask Solutions will play a key role in supporting the for advanced photomasks remains solid. At the same time, corporate

  4. Slide 4: Global Evolution Driven by Moore's Law

    Global Evolution Driven by Moore’s Law | Pushing the Boundaries of Semiconductor Technology with High-NA and Next-Gen Logic 2023 2024 2025 2026 2027 2028 2029 2030 N4/N3 N3 N3/N2 N2 N2/A14 A14 A14/A10 A10 I3 I20A I18A I14A I10A GAA FET | 4nm/3nm Ribbon GAA FET | 1.8nm Ribbon GAA FET | 1.4nm CFET | 1

  5. Slide 5: Three Pillars of Future Technologies Driving Photomask Solutions

    Three Pillars of Future Technologies Driving Photomask Solutions Shift from solely Scale-Determined to Function-Optimized Chip Design 1 2 3 High-NA EUV CFET – Transistor Heterogeneous Integration Source: ASML Investor Day 2024 Source: IMEC Source: TSMC 2025 Technology Symposium Public | SUSS Capital

  6. Slide 6: Three Pillars of Future Technologies Driving Photomask Solutions

    Three Pillars of Future Technologies Driving Photomask Solutions Shift from solely Scale-Determined to Function-Optimized Chip Design 1 2 3 High-NA EUV CFET – Transistor Heterogeneous Integration Higher resolution imaging Vertical transistor stacking Disintegration into Chiplets introduces new mask

  7. Slide 7: Three Pillars: Demand outlook 2030

    Three Pillars of Future Technologies Driving Photomask Solutions Demand outlook 2030 – SUSS is well positioned across FEOL & BEOL Market growth forecast 2025 – 2030 1 2 3 High-NA EUV CFET – Transistor Heterogeneous (FEOL1) (FEOL1) Integration (BEOL2) Photomask Advanced Photomask High-End Capability

  8. Slide 8: 02 Vision & Strategy

    Agenda 01 Market Outlook 02 Vision & Strategy 03 Financial Highlights 04 Summary Public | SUSS Capital Markets Day 2025

  9. Slide 9: Strategy to Win

    Strategy to Win | Leading the industry through cutting-edge technology & sustainable solutions High-NA and CFET will set new technology benchmarks, while Heterogeneous Integration including Advanced Packaging drives volume growth Market leader High-End Photomask cleaning: Committed to sustaining lea

  10. Slide 10: Product Portfolio Roadmap

    Product Portfolio Roadmap 2026 will be a Milestone Year with three Major Product Launches 2024 2025 2026 2027 2028 2029 2030 Overall Status 1 MaskTrack PRO/X CL: HVM 45nm – 2nm Photomask High-end Cleaning 2 MaskTrack X GB: DUV EUV 3 MaskTrack SMART CL: Evaluation HVM 32nm – A1x Launch in 2026 ASx 55

  11. Slide 11: MaskTrack SMART Cleaning System

    MaskTrack SMART Cleaning System | Expanding Hybrid Solutions from Optical Mask Technologies to High-NA EUV MaskTrack SMART Superior particle removal through super high-frequency physical force cleaning Launch in 2026 Gentle surface preparation through ICP Plasma1 surface treatment Optimized coverage

  12. Slide 12: Photomask Cleaning Evolution in High-NA EUV Era

    Photomask Cleaning Evolution in High-NA EUV Era | Tackling Shrinking CDs, 3D Mask Effects, Tight Overlay, High EUV Power and Zero Defect 1 2 3 Photomask Challenges SUSS Excellence Competitive Advantage • Anamorphic imaging • Advanced particle removal control • Outstanding acknowledged process Needs

  13. Slide 13: ASx9500 Cleaning System

    ASx9500 Cleaning System A Scalable Mid-End Tool Configurable with only the Required Functions ASx9500 – Launch in 2026 Scalable technology platform supporting technology nodes from 90 nm to 38 nm Cost-efficient platform architecture enabling high productivity within a compact space High performance

  14. Slide 14: Mature Node Growth Expected to More Than Double by 2030

    Mature Node Growth Expected to More Than Double by 2030 Reaching Scale Comparable to High-End Nodes Global Photomask Market Value by Technology Market dynamics Node (USD Billions, 2023 – 2030) • AI, Automation & IoT: Sustaining semiconductor demand • China: Scaling mature nodes beyond 2027 Market Va

  15. Slide 15: GreenTrack Wafer Cleaning System

    GreenTrack Wafer Cleaning System | All-in-One Solution for Environmental Impact Reduction, TCO Improvement, and more GreenTrack Wafer Cleaning – Launch in 2026 CrustBuster technology for advanced water-based cleaning Sustainable processing through TurbulenStrip technology utilizing green fluids SUSS

  16. Slide 16: From Concept to Reality

    From Concept to Reality Building Competitive Advantage Through Green Technology CrustBuster Technology UV Water Activation 0 min 1.5 min 3 min TurblenStrip Technology Green Fluids: • High performance • Water-based liquid • Biodegradable • Improved health and safety 100x, 10 min Public | SUSS Capital

  17. Slide 17: GreenTrack Wafer Cleaning System: Market Projected to Quadruple

    GreenTrack Wafer Cleaning System | Strategic Entry into a Market Projected to Quadruple in SAM Alongside Product Launches Serviceable Available Market [€m] 200mm: +1,100 MEMS, Power- & High Frequency- devices and ~1,400 CMOS Image Sensors ~1,400 ~300 Green Track 200mm Launch 2026 SAM 2024 Expansion

  18. Slide 18: 03 Financial Highlights

    Agenda 01 Market Outlook 02 Vision & Strategy 03 Financial Highlights 04 Summary Public | SUSS Capital Markets Day 2025

  19. Slide 19: Raising our revenue target for 2030

    Based on our strong execution since the last Capital Markets Day, we are now in a position to raise our revenue target for 2030 Capital Markets Day 2023 Capital Markets Day 2025 Revenue [€m] Revenue [€m] 2x 131 Target 90 2x Accelerated execution 2023 Technological innovation Act 2023 Plan 2030 Relen

  20. Slide 20: Revenue and Margin Outlook

    Revenue and Margin Outlook | Driving Growth through both Product Lines: Photomask and GreenTec Revenue in €m & Gross Profit Margin in % Key Takeaways Key Takeaways 300 Photomask: Photomask: Revenue Outlook: 2026 will likely mark a short pause Capital 275 in growth as Outlook: Revenue the industry202

  21. Slide 21: 04 Summary

    Agenda 01 Market Outlook 02 Vision & Strategy 03 Financial Highlights 04 Summary Public | SUSS Capital Markets Day 2025

  22. Slide 22: Summary: Sustainable growth toward 2030

    Summary | Sustainable growth toward 2030 through Technology, Market Expansion, & Sustainability – expanding from mask to wafer cleaning Revenue development (in €m) Our Vision Driving transformation and sustainable growth toward 2030 CAGR: 11 – 15% through Technology, Market Expansion, and Sustainabi

  23. Slide 23: Disclaimer

    Disclaimer The following presentations contain forward-looking statements relating to the business, financial performance and earnings of SUSS MicroTec SE and its subsidiaries and associates. Forward-looking statements are based on current plans, estimates, projections and expectations and are there

SUSS MicroTec — Investor Day (2025) on 6ix