Slide 1: ASML 2013 Third Quarter Results
Veldhoven, the Netherlands October 16, 2013 ASML confirms 2013 outlook and sees H2 2013 sales levels continuing in H1 2014 ASML 2013 Third Quarter Results
Slide 2: Forward looking statements "Safe Harbor" Statement
Forward looking statements "Safe Harbor" Statement under the US Private Securities Litigation Reform Act of 1995: the matters discussed in this document may include forward-looking statements, including statements made about our outlook, expected sales levels, realization of systems backlog, IC unit
Slide 3: Business summary, Business environment, ASML technology status, Outlook
Business summary Business environment ASML technology status Outlook 16 October 2013 Public Slide 3
Slide 4: Business summary
Business summary 16 October 2013 Public Slide 4
Slide 5: Net system sales breakdown in value: Q3 2013
Net system sales breakdown in value: Q3 2013 Total value is € 959 million Technology (CHART) I-Line 1% ArF Immersion 88% KrF 11% (CHART) Korea 39% Taiwan 51% USA 1% Region (CHART) Foundry 60% Memory 38% IDM 2% End-Use (CHART) Sales in Units 20 10 4 16 October 2013 Public Slide 5 Numbers have been ro
Slide 6: Q3 results - highlights
Q3 results - highlights Net sales of € 1,318 million, 34 litho systems sold, valued at € 959 million, net service and field option sales at € 359 million Gross margin of 40.3% Amongst others, including 3.3% inventory fair value adjustment Cymer acquisition Operating margin of 16.1% Net bookings of €
Slide 7: Total net sales
(CHART) Total net sales M€ 3,768 Numbers have been rounded for readers' convenience 2,954 1,596 4,508 5,651 16 October 2013 Q1 Q2 Q3 Q4 Slide 7 4,732 Public
Slide 8: Consolidated statements of operations
Q2 13 Q3 13 Net sales 1,187 1,318** Gross profit 482 531 Gross margin % 40.6% 40.3% Other income (CCIP*) 16 17 R&D costs (200) (244) SG&A costs (68) (91) Income from operations 230 212 Operating income % 19.4% 16.1% Net income 221 193 Net income as a % of net sales 18.6% 14.7% Earnings per share (ba
Slide 9: Key financial trends 2012 - 2013
Key financial trends 2012 - 2013 Consolidated statements of operations M€ Numbers have been rounded for readers' convenience Q3 12 Q4 12 Q1 13 Q2 13 Q3 13 Net sales 1,229 1,023 892 1,187 1,318 Gross profit 531 420 341 482 531 Gross margin % 43.2% 41.1% 38.2% 40.6% 40.3% R&D costs (144) (155) (185) (
Slide 10: Balance sheets
Balance sheets M€ Numbers have been rounded for readers' convenience Assets Jun 30st, 2013 Sep 29st, 2013 Cash & cash equivalents and short-term investments 2,351 23% 2,724 25% Net accounts receivable and finance receivables 883 8% 1,070 10% Inventories, net 2,359 23% 2,480 22% Other assets 584 6% 6
Slide 11: Cash flows
Cash flows M€ Numbers have been rounded for readers' convenience Q2 13 Q3 13 Net income 221 193 Adjustments to reconcile net income to net cash flows from operating activities: Impairment and obsolescence 36 49 Depreciation and amortization 49 68 Deferred income taxes 15 (13) Other non-cash items 10
Slide 12: Bookings activity by sector, EUV not included
Bookings activity by sector, EUV not included Total value M€ 1,415 Net booked 49 new tools at € 1,409 million 2 used tools at € 6 million Numbers have been rounded for readers' convenience 16 October 2013 Public Slide 12 (CHART) Memory 42% IDM 26% Foundry 32%
Slide 13: Backlog in value per Sep 29th, EUV not included
Backlog in value per Sep 29th, EUV not included Total value M€ 1,838 Numbers have been rounded for readers' convenience 80% of backlog carries shipment dates in the next 6 months 16 October 2013 Public Slide 13 Technology (CHART) ArF immersion 77% KrF 19% ArF dry 4% (CHART) End-use Foundry 29% Memor
Slide 14: Capital return to shareholders
Capital return to shareholders 16 October 2013 Public Slide 14 Through 30 September 2013, ASML acquired 2.2 million shares for a total consideration of € 136.3 million. The repurchased shares will be cancelled 14% of the announced € 1.0 billion 2013-2014 buy back program has been executed The compan
Slide 15: Business environment
Business environment 16 October 2013 Public Slide 15
Slide 16: Business environment
Business environment Foundry and Logic customers continue to place orders for our advanced tools to enable volume manufacturing of their next generation 14-16-20 nm devices We have also seen healthy bookings from memory customers, driven by DRAM technology upgrades and additional NAND capacity ASML
Slide 17: ASML technology status
ASML technology status 16 October 2013 Public Slide 17
Slide 18: Q3 product highlights
Q3 product highlights Our new TWINSCAN NXT:1970Ci system offers overlay below 2 nm, focus control at less than 20 nm and productivity of more than 250 wafers per hours About 250 TWINSCAN NXT:1950i and NXT:1960Bi systems currently in use by our customers are field-upgradeable to the NXT:1970Ci perfor
Slide 19: New generation NXT:1970Ci is now shipping
New generation NXT:1970Ci is now shipping Productivity 250 wafers per hour Improvements effect various aspects of system performance 16 October 2013 Public Slide 19 Overlay Imaging/Focus Defectivity Productivity Legend: knife for low defects Immersion hood Lens UV level sensor Wafer table PARIS sens
Slide 20: ArFi roadmap enables smooth transition to EUV
ArFi roadmap enables smooth transition to EUV As well as supporting multiple patterning requirements until at least 2018 Public Slide 20 NXT:1950i NXT:1960Bi NXT:1970Ci Timing Q4 2011 Q1 2013 1H 2014 Overlay DCO / MMO 2.5 / 5.5nm 2.5 / 4.5nm 2.0 / 3.5nm Full Wafer Focus Unif 30nm 22nm 20nm Full Wafe
Slide 21: NXT platform solidly established as factory workhorse
NXT platform solidly established as factory workhorse Peak performance in excess of 5000 wafers per day Best wafers per day (CHART) Wafers per day 16 October 2013 Public Slide 21
Slide 22: YieldStar metrology in volume production
(CHART) YieldStar metrology in volume production Shipped more than 100 systems to date 16 October 2013 Public Slide 22
Slide 23: EUV update
EUV update Integration work on our NXE:3300B EUV scanners is progressing steadily We are installing the first NXE:3300B systems at customer sites We remain on target to deliver systems with a throughput of 70 wafers per hour in 2014, subsequently upgradeable to 125 wafers per hour in 2015 Based upon
Slide 24: EUV best solution for cost effective shrink in future
EUV best solution for cost effective shrink in future (CHART) FinFET: no cost reduction Double patterning Limited scope for cost reduction on ArFi due to multiple patterning Single expose EUV best option for cost reduction ArFi EUV " 16 October 2013 Public Slide 24
Slide 25: Current EUV imaging performance meets 10 nm requirements
Current EUV imaging performance meet production requirements of the 10 nm and it will be extendable to the 7 nm logic node Public Slide 25 ArFi Imaging 75nm 50nm 22nm 31nm ArFi (Double patterning) 16nm Node ? 1st insertion point for EUV Current EUV Imaging (Single Exposure) Industry requirements 16
Slide 26: Outlook
Outlook 16 October 2013 Public Slide 26
Slide 27: Q4 outlook
Q4 outlook Net sales about € 1.8 billion Gross margin 43 - 44% R&D costs of about € 255 million SG&A costs of about € 90 million (including approx. € 10 million restructuring charges ending Q4) Other income (Customer Co-Investment Program) of € 17 million Q4 gross margin includes: Non-cash purchase
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