Asml Holding Nv · EURONEXT:ASML

Asml Holding Nv — UBS Global Technology and Services Conference 2009

26 slides from Asml Holding Nv's conference presentation, Jun 10, 2009

  1. Slide 1: UBS Global Technology and Services Conference

    UBS Global Technology and Services Conference New York City Craig DeYoung VP, Investor Relations & Corporate Communications June 9, 2009

  2. Slide 2: Safe Harbor

    Safe Harbor "Safe Harbor" Statement under the US Private Securities Litigation Reform Act of 1995: the matters discussed in this document may include forward-looking statements, including statements made about our outlook, realization of backlog, IC unit demand, financial results, average sales pric

  3. Slide 3: The Markets

    The Markets DRAM 300mm litho capacity utilization recovering while 200mm capacity is being built off DRAM 1Gb prices continue to rise DRAM manufacturers with 55nm process are making money DRAM manufacturer without 55nm process resume process "shrink" plans Some DRAM players preparing 45nm processes

  4. Slide 4: DRAM revenues appear to bottom out in March

    DRAM revenues appear to bottom out in March YoY DRAM unit growth still well below average of analysts Source: WSTS, ASML Last data point: March 2009 Analyst Average

  5. Slide 5: DRAM utilization recovering while 200mm capacity is built off

    DRAM 300 mm utilization recovering while 200mm capacity is built off

  6. Slide 6: DRAM prices continue to increase during April

    Source: DRAM Exchange (05/2009) DRAM 1 Gb prices continue to increase during April, due to persistent supply cut-backs, 5x nm manufacturers are cash positive 300 mm cash-costs for 5x nm 1 Gb DRAM between 0.8 & 0.9 USD 300 mm cash-costs for 7x nm 1 Gb DRAM between 1.4 & 1.6 USD 300 mm cash-costs for

  7. Slide 7: Q1/09 DRAM operating margins

    Q1/09 DRAM operating margins: Production cut-backs resulted in negative op. margins for all players, despite rising ASPs Source: DRAMeXchange (2/09), ASML Most advanced prod. node in Q1/09: 5x nm 5x nm 6x nm 6x nm 7x nm 7x nm

  8. Slide 8: 3mma NAND sales rising as normal seasonal behavior

    3mma NAND sales is rising as normal seasonal behavior 1Q09 units growth lower than annual forecast Analyst Average Source: WSTS, ASML Last data point: March 2009

  9. Slide 9: NAND utilization, moving back to normal levels

    NAND utilization, moving back to normal levels * One major manufacturer's dry tool utilization (?30% idle) is not capture in this graph

  10. Slide 10: NAND MLC ASPs stabilized above cash-costs

    Source: DRAM Exchange (05/2009) 300 mm cash-costs for 4x nm 16 Gb MLC NAND between 1,9 and 2,4 USD NAND MLC 16 Gb mainstream ASPs stabilized above 4x and 5x nm cash-costs 300 mm cash-costs for 5x nm 16 Gb MLC NAND between 2.5 and 3,1 USD

  11. Slide 11: Operating Margins of main NAND Manufacturers

    Operating Margins of main NAND Manufacturers (Q1/06 - Q1/09) - -100% - -80% - -60% - -40% - -20% 0% 20% 40% 60% 1Q06 2Q06 3Q06 4Q06 1Q07 2Q07 3Q07 4Q07 1Q08 2Q08 3Q08 4Q08 1Q09 Operating Margin [% of Sales] Q1/09 NAND operating margins: Margins driven by raising ASPs. Most advanced volume node in Q1

  12. Slide 12: Logic sales appear to have reached a bottom in March 2009

    Logic sales appear to have reached a bottom in March 2009 Analyst Average Source: WSTS, ASML Last data point: March 2009

  13. Slide 13: Foundry utilizations are recovering fast

    Foundry utilizations are recovering fast - but well below trigger point for capacity buys

  14. Slide 14: Market Opportunity

    Market Opportunity

  15. Slide 15: Technology developments continue

    * Note: Process development 1.5 ~ 2 years in advance of manufacturing Year of production start* 1/1/02 1/1/03 1/1/04 1/1/05 1/1/06 1/1/07 1/1/08 1/1/09 1/1/11 1/1/12 1/1/13 1/1/14 1/1/15 1/1/10 Resolution/half pitch, "Shrink" [nm] 20 30 40 50 60 80 200 100 Logic Logic / SRAM 6 Transistor SRAM Cell k

  16. Slide 16: Lithography total market growth opportunity - simulation

    Source: ASML Lithography total market growth opportunity - simulation Historical trends projected Factual until 2008 + simulation for 2009 IC trend-based simulation 0 1000 2000 3000 4000 5000 6000 7000 8000 9000 10000 11000 2006 2007 2008 2009 2010 2011 2012 2013 2014 2015 WW Litho Demand Simulation

  17. Slide 17: Bottom-up scenario: Four engines of growth

    Bottom-up scenario: Four engines of growth Even when assuming slow chip unit growth of 4% (due to Moore's Law slowdown and slower electronics consumption in the West) More DRAM in expanding consumer electronics. Additional €1.2B Litho revenue over 5 years. NAND/DRAM penetration rises to 10% of hard

  18. Slide 18: Bottoms-up scenario: significant litho demand indicated

    Source: ASML Bottoms-up scenario: significant litho demand indicated Conservative scenario (4% unit growth) + emerging growth markets Factual until 2008 + simulation for 2009 IC trend-based simulation 0 1000 2000 3000 4000 5000 6000 7000 8000 9000 10000 11000 2006 2007 2008 2009 2010 2011 2012 2013

  19. Slide 19: ASML confirms its strategy

    ASML confirms its strategy The lithography market offers significant growth potential; the company target of EUR 5 billion in annual revenues is still achievable, timing depending on macro economic circumstances ASML's key success factor is unmatched R&D innovation which will remain unaffected in th

  20. Slide 20: ASML Product Strategy Enabling the future

    ASML Product Strategy Enabling the future

  21. Slide 21: Committed to R&D

    Committed to R&D New product introduction on track ASML is using its financial strength to uniquely continue aggressive R&D spending in strategic development programs to ensure timely introduction of next node production solutions Proved EUV imaging with the first full field 28 nm dense lines Introd

  22. Slide 22: TWINSCAN NXT - improved overlay and productivity

    TWINSCAN NXT - improved overlay and productivity Suitable for double patterning 32 nm and beyond x, y : 1.6nm, 1.7nm overlay x, y : 1.9nm, 1.8nm overlay Platform capability >200 wafers per hour Excellent overlay shown during SPIE

  23. Slide 23: EUV pre-production systems ready in 2010

    EUV pre-production systems ready in 2010 First full field 28 nm dense lines imaged

  24. Slide 24: Summary

    Summary Nt ‘seas ASML ly

  25. Slide 25: Summary

    Summary Litho system utilization at leading edge improving across all sectors Shrink drivers remain in all sectors (Device cost and functionality improvements) Technology purchases resume to support litho process node transitions in all sectors ASML continues to manage the company for cash generatio

  26. Slide 26: Slide 26

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