Agfa-Gevaert NV · EURONEXT:AGFB
Agfa-Gevaert NV — PCMI 2006 Spring Conference
39 slides from Agfa-Gevaert NV's conference presentation, Apr 3, 2006
Slide 1: Silverhalide Photomasks with sub mil lines mounted on glass
PCMI 2006 Spring Conference Carnfield University April 3th Silverhalide Photomasks with sub mil lines mounted on glass Eric Janssens Agfa-Gevaert N.V. Mortsel-Belgium
Slide 2: Film characteristics
Film characteristics Min. & max. density Scratch resistance Fitness for AOI Line sharpness Dimensional stability Base material purity Line roughness Manipulation and transport Dust level Fine line capability Load – unload plotter Packaging and labeling Line width control Fly off in plotter Archivabi
Slide 3: Film characteristics
Film characteristics Min. & max. density Scratch resistance Fitness for AOI Line sharpness Dimensional stability Base material purity Line roughness Manipulation and transport Dust level Fine line capability Load – unload plotter Packaging and labeling Line width control Fly off in plotter Archivabi
Slide 4: Film characteristics
Film characteristics Min. & max. density Scratch resistance Fitness for AOI Line sharpness Dimensional stability Base material purity Line roughness Manipulation and transport Dust level Fine line capability Load – unload plotter Packaging and labeling Line width control Fly off in plotter Archivabi
Slide 5: Image Integrity improvement
Image Integrity improvement • Solution: a l st – Smaller AgX crystals ry c tion – Better crystal size and shape control gX uc A od – Better crystal size distribution control pr • Consequences: – Lower sensitivity – Lower Dmax – Thinner layers, more difficult to control L&W consistency – More ghost i
Slide 6: AgX crystal production
AgX crystal production • 1st day: peptization n t s me – Blending of the ingredients v e p r o – Formation of crystal germ (shape) I m • 2 day: ripping e – Grow germs to crystals of the right size (and shape) • Storage • 3e day: sensibilization: – Add ingredients to get the final characteristics – P
Slide 7: AgX crystal production 1st day
AgX crystal production 1st day Pushed technology to the very end Concentration of ingredients New generation reaction stabilizators controllers Timing mixing ingredients Blending speed and location Mixing speed and flow pattern when mixing Temperature control pH control Level control …. Eric Janssen
Slide 8: AgX crystals
AgX crystals Eric Janssens March 2006 Slide 8
Slide 9: Consequences
Consequences • Lower sensitivity • Lower Dmax • Thinner layers, more difficult to control L&W consistency • More ghost image • Matt particle size New improved latent image enhancement component Eric Janssens March 2006 Slide 9
Slide 10: Consequences
Consequences • Lower sensitivity • Lower Dmax • Thinner layers, more difficult to control L&W consistency • More ghost image • Matt particle size Pushed technology to the very end Eric Janssens March 2006 Slide 10
Slide 11: Consequences
Consequences • Lower sensitivity • Lower Dmax Antihalo integrated in emulsion layer • Thinner layers, more difficult to control L&W consistency • More ghost image • Matt particle size Gelatine free back Eric Janssens March 2006 Slide 11
Slide 12: Consequences
Consequences • Lower sensitivity • Lower Dmax • Thinner layers, more difficult to control L&W consistency • More ghost image • Matt particle size Image side: none Back: 5.7 ¨ 4.1 µm Eric Janssens March 2006 Slide 12
Slide 13: Image Integrity: Measurement
Image Integrity: Measurement Eric Janssens March 2006 Slide 13
Slide 14: Image Integrity: Measurement
Image Integrity: Measurement Eric Janssens March 2006 Slide 14
Slide 15: Line edge analysis method
Line edge analysis method • Measurement of : – Line width – Line width variation – Edge sharpness – Edge roughness Eric Janssens March 2006 Slide 15
Slide 16: HiRes on First EIE RP
HiRes on First EIE RP 525 LW 12,7 µm @ 25 400 dpi Eric Janssens March 2006 Slide 16
Slide 17: HiRes on ManiaTechnolgy Phoenix
HiRes on ManiaTechnolgy Phoenix LW 5 µm @ 40 000 dpi Eric Janssens March 2006 Slide 17
Slide 18: HiRes on Orbotech LP 9008 HR
HiRes on Orbotech LP 9008 HR LW 10 µm @ 25 400 dpi Eric Janssens March 2006 Slide 18
Slide 19: HiRes on Screen RG 8500
HiRes on Screen RG 8500 LW 10 µm @ 25 400 dpi Eric Janssens March 2006 Slide 19
Slide 20: HiRes on Pentax LPP 3820
HiRes on Pentax LPP 3820 LW 10 µm @ 12 000 dpi Eric Janssens March 2006 Slide 20
Slide 21: HiRes & G2G with AT&S
HiRes & G2G with AT&S Eric Janssens March 2006 Slide 21
Slide 22: Eric Janssens March 2006 Slide 22
Eric Janssens March 2006 Slide 22
Slide 23: Image Integrity
Image Integrity Line sharpness: 0,40 µm Line roughness: 0,70 µm Line width: down to 5 µm Line width control: no data This will do the job Eric Janssens March 2006 Slide 23
Slide 24: Dimensional stability: AgX film
Dimensional stability AgX film: Fact of live CRH = 11 µm / m %RH τ = 6 hours CT = 18 µm / m ºC τ = 30 seconds Eric Janssens March 2006 Slide 24
Slide 25: Dimensional stability: glass
Dimensional stability s s la G CRH = 0 µm / m %RH τ = ….. CT = 4 µm / m ºC τ = 10 minutes Eric Janssens March 2006 Slide 25
Slide 26: Dimensional stability: glass
Dimensional stability: glass Eric Janssens March 2006 Slide 26
Slide 27: Dimensional stability: G2G
Dimensional stability: G2G Plot Develop Acclimatize Laminate to glass NEW Print Gelatine free back Remove film Eric Janssens March 2006 Slide 27
Slide 28: G2G: characteristics
G2G: characteristics Test result Transparency OK (compareable to AgX film) Dmin visual + 0.00 Æ + 0.01 = OK Dmin UV + 0.00 Æ + 0.01 = OK Coloration No coloration after 8 h on contact frame (5 KW) Adhesion Glass side and film side: OK Adhesion to film OK, both for standard back and plastic back Peel
Slide 29: G2G: characteristics
G2G: characteristics Eric Janssens March 2006 Slide 29
Slide 30: G2G: with AT&S
G2G: with AT&S Eric Janssens March 2006 Slide 30
Slide 31: G2G: with AT&S
G2G: with AT&S Eric Janssens March 2006 Slide 31
Slide 32: G2G: with AT&S
G2G: with AT&S If laminator works reproducable The offset can be compensated in the RIP of the plotter Eric Janssens March 2006 Slide 32
Slide 33: G2G: with AT&S
G2G: with AT&S Eric Janssens March 2006 Slide 33
Slide 34: G2G: with AT&S
G2G: with AT&S Eric Janssens March 2006 Slide 34
Slide 35: G2G: with AT&S
G2G: with AT&S Eric Janssens March 2006 Slide 35
Slide 36: G2G: with AT&S
G2G: with AT&S Eric Janssens March 2006 Slide 36
Slide 37: Conclusion
Conclusion With: ¾ existing design stations ¾ existing (up-to-date) plotter (modified) ¾ HiRes film ¾ existing processor and chemistry ¾ additional laminator ¾ existing (up-to-date) printers (modified) It is possible to generate sub mil structures with excellent dimensional stability with good yield
Slide 38: PCMI presentation dd 03/04/2006
http://phototooling.agfa.com PCMI presentation dd 03/04/2006 Eric Janssens March 2006 Slide 38
Slide 39: Thank you
Thank you Eric Janssens March 2006 Slide 39