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WiMi Developed Digital Holography-Based Semiconductor Wafer Defect Detection Technology
BEIJING, Aug. 31, 2023 /PRNewswire/ -- WiMi Hologram Cloud Inc. (NASDAQ: WIMI) ("WiMi" or the "Company"), a leading global Hologram Augmented Reality ("AR")
About this update from Wimi Hologram Cloud Inc.
[{"type":"text","content":"BEIJING, Aug. 31, 2023 /PRNewswire/ -- WiMi Hologram Cloud Inc. (NASDAQ: WIMI) (\"WiMi\" or the \"Company\"), a leading global Hologram Augmented Reality (\"AR\") Technology provider, today announced that an innovative detection technique based on digital holography has been developed to meet the needs of semiconductor wafer defect detection. The technique utilizes digital holography to record the amplitude and phase of the wavefront from the target object directly to the individual images acquired by the CCD camera, and can effectively detect defects on wafers as small as a few nanometers by resolving the phase difference of the height difference.\nDigital holography is a high-resolution imaging technique based on optical principles that records and analyzes wavefront information about a target object. By utilizing deep ultraviolet laser illumination and phase difference analysis, the technique is able to accurately detect defects as small as a few nanometers on structures with high aspect ratios. Compared to traditional defect detection methods, digital holography has the advantages of higher sensitivity, better resolution, and non-destructive testing. Defect detection on semiconductor wafers has always been an integral part of the semiconductor manufacturing process. As the size of semiconductor devices continues to shrink and process complexity, traditional defect detection methods are facing challenges. To address this issue, WiMi's R&D team has successfully introduced digital holography into the defect inspection of semiconductor wafers through their tireless efforts.\nDigital holography utilizes deep-ultraviolet laser illumination to record the amplitude and phase information of the wavefront of the target object. By dividing the laser beam into reference light and object light and irradiating them onto the CCD camera and the object to be measured respectively, the interference patterns of the reference light and object light are obtained. Then, the amplitude and phase information of the object light can be recovered from the interference pattern by a mathematical reconstruction algorithm. The phase information can accurately reflect the surface topography of the target object.\nWiMi's successful development of semiconductor wafer defect detection technology through the use of digital holography will bring many benefits t...