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IRRESISTIBLE MATERIALS AND TOKYO OHKA KOGYO CO., LTD. (TOK) ANNOUNCE STRATEGIC INVESTMENT AND JOINT DEVELOPMENT PARTNERSHIP TO ADVANCE EUV LITHOGRAPHY
Irresistible Materials, Ltd. (IM), a leader in the development of novel photoresist materials for extreme ultraviolet (EUV) lithography, and Tokyo Ohka Kogyo Co., Ltd. (TOK) (TSE: 4186.T), a market leader in the photoresist industry, today announced a strategic financial investment and joint development partnership focused on accelerating innovations in photoresists for EUV lithography. The investment from TOK is a recognition of IM's innovative and patented EUV resist platform, Multi-Trigger Re
About this update from Tokyo Ohka Kogyo Co., Ltd.
[{"type":"text","content":"The collaboration combines Irresistible Materials' advanced photoresist materials platform with TOK's long-standing market leadership and world-class manufacturing to drive innovations for EUV lithography","length":217,"tagName":"p","attribs":{}},{"type":"text","content":"BIRMINGHAM, United Kingdom and KAWASAKI CITY, Japan, Feb. 23, 2026 /PRNewswire/ -- Irresistible Materials, Ltd. (IM), a leader in the development of novel photoresist materials for extreme ultraviolet (EUV) lithography, and Tokyo Ohka Kogyo Co., Ltd. (TOK) (TSE: 4186.T), a market leader in the photoresist industry, today announced a strategic financial investment and joint development partnership focused on accelerating innovations in photoresists for EUV lithography. The investment from TOK is a recognition of IM's innovative and patented EUV resist platform, Multi-Trigger Resist (MTR™), as a strong complement to chemically amplified resist (CAR) and metal oxide resist (MOR) platforms for the enablement of low-NA and high-NA EUV lithography. MTR has demonstrated strong potential for fulfilling the performance needs of integrated device manufacturers (IDMs) and foundries as well as delivering cost of ownership (CoO) savings for EUV device manufacturing. As part of the joint development partnership, IM and TOK will focus exclusively on accelerating the MTR development roadmap and advancing the commercialization of MTR to drive customer adoption across the industry.","length":1191,"tagName":"p"},{"type":"image","alt":"Irresistible Materials' Multi-Trigger Resist (MTRTM) for EUV lithography.\r\nSource: Irresistible Materials","displaySize":"","headline":null,"caption":"Irresistible Materials' Multi-Trigger Resist (MTRTM) for EUV lithography. Source: Irresistible Materials","className":"","disableSlideshowImg":false,"size":{"original":{"width":400,"height":225,"url":"https://media.zenfs.com/en/prnewswire.com/611c916bf94807cbc73d4a73d6090d0f"},"resized":{"url":"https://s.yimg.com/ny/api/res/1.2/igfMyioiP3_BlsaDExbLLg--/YXBwaWQ9aGlnaGxhbmRlcjt3PTcwNTtoPTM5NztjZj13ZWJw/https://media.zenfs.com/en/prnewswire.com/611c916bf94807cbc73d4a73d6090d0f","width":400,"height":225}},"href":"https://mma.prnewswire.com/media/2917839/Final_IM_Press_release_info_graphic_ID_0c0f5d13dbcb.html","hrefExternal":true,"rel":"nofollow"},{"type":"text","content":"IM w...