Business
Key NanoImprint Lithography Milestone
Key NanoImprint Lithography Milestone.
About this update from Iqe Plc
[{"type":"text","content":"\n \nRNS Number : 9708T IQE PLC 09 July 2018 \n\nFor release 9th July 2018\n \n \nIQE plc\n(\"IQE\" or the \"Company\")\n \nProduction Qualification Milestone for IQE's proprietary NanoImprint Lithography (NIL) Technology for DFB lasers \n \nCardiff, UK, 09 July 2018. IQE (AIM:IQE) announces that its proprietary NanoImprint Lithography (\"NIL\") technology has reached a significant milestone. The new technology offering has been production qualified by a leading supplier of Distributed Feedback (\"DFB\") lasers into the telecoms industry, and the first production order for USD 250,000 has been received. Production will commence immediately. \n \nDFB lasers are high performance edge emitting (EE) lasers that are critical enabling transmission components for high-speed data communications across the whole fibre optic network; including intercontinental communications, broadband Fibre To The Home and Premises, and ultra-high speed transmission links in hyper-scale data centre applications. Exponential future demand for DFBs in this sector will be driven by 5G connectivity and the adoption of Internet of Things (\"IoT\"). \n \nIn addition, the high optical quality of the DFB device makes it the edge emitting laser of choice for the commoditisation in the consumer sector for a wide range of emerging sensing applications such as 3D sensing, environmental emissions and air quality monitoring, chemical weapons and explosives detection, and disease diagnosis via breath and blood vessel monitoring.\n \nIn addition to DFB applications, IQE are also currently engaged in multiple other qualification programmes incorporating the Nanoimprint Lithography technology across a range of wafer sizes and end applications.\n \nNanoImprint Lithography is a powerful technology for the large scale and low-cost manufacture of submicron features in a variety of materials, including compound semiconductors, silicon, glass, oxides and flexible materials such as polymers. IQE's proprietary technology is capable of achieving the complex patterns typically produced using expensive and slow throughput e-beam lithography, but at a much lower cost and much higher throughput. Applications include a multitude of photonics products, including gratings for DFB lasers, Micro and Patterned Sapphire Substrat...