Press release
Intel to Sell Minority Stake in IMS Nanofabrication Business to TSMC
New equity investment builds on sale of a near-20% stake to Bain Capital to accelerate IMS’ growth and innovation. SANTA CLARA, Calif.--(BUSINESS WIRE)--
About this update from Intel Corporation
[{"type":"text","content":"\nNew equity investment builds on sale of a near-20% stake to Bain Capital to accelerate IMS’ growth and innovation.\n\n\n SANTA CLARA, Calif.--(BUSINESS WIRE)--\nIntel Corporation today announced that it has agreed to sell an approximately 10% stake in the IMS Nanofabrication business (“IMS”) to TSMC. TSMC’s investment values IMS at approximately $4.3 billion, consistent with the valuation of the recent stake sale to Bain Capital Special Situations (“Bain Capital”). Intel will retain majority ownership of IMS, which will continue to operate as a standalone subsidiary under the leadership of CEO Dr. Elmar Platzgummer. The transaction is expected to close in the fourth quarter of 2023.\n\nThis press release features multimedia. View the full release here: https://www.businesswire.com/news/home/20230912608101/en/A member of the Intel Mask Operation team in Hillsboro, Oregon, holds a mask used in advanced lithography tools to create computer chips. The mask is created with a multimillion-dollar machine called a multi-beam mask writer built by the Austria-based company IMS Nanofabrication, an Intel company. (Credit: Intel Corporation)\nIMS is the established industry leader in multi-beam mask writing tools required to develop advanced extreme ultraviolet lithography (EUV), which is broadly adopted in leading-edge technology nodes that enable the most demanding computing applications, such as artificial intelligence (AI) and mobile. Together, Bain Capital and TSMC’s investments provide IMS with increased independence and reinforce confidence in the significant opportunity ahead of IMS. This added autonomy will help IMS accelerate its growth and drive the next phase of lithography technology innovation to enable the industry’s transition into new patterning systems, such as high-numerical-aperture (high-NA) EUV.\n\n\nMatt Poirier, senior vice president of Corporate Development at Intel, said, “This investment demonstrates the deep industry collaboration IMS is pioneering to advance critical lithography technology for leading-edge nodes, which will benefit the entire semiconductor manufacturing ecosystem. With enhanced independence, IMS will be well positioned to address the significant growth opportunity for multi-beam mask writing tools over the next decade and beyond.”\n\n\nPlatzgummer said, “We are delighted to bring in new investo...