Press release

Intel Agrees to Sell Minority Stake in IMS Nanofabrication Business to Bain Capital

Transaction will accelerate innovation of critical multi-beam mask writing tools, foster deeper cross-industry collaboration. NEWS HIGHLIGHTS Transaction

articleIntel CorporationJune 21, 20233/company/intel-corporation/news/intel-agrees-to-sell-minority-stake-in-ims-nanofabrication-business-to-bain-capital
Intel Agrees to Sell Minority Stake in IMS Nanofabrication Business to Bain Capital

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[{"type":"text","content":"\nTransaction will accelerate innovation of critical multi-beam mask writing tools, foster deeper cross-industry collaboration.\n\n\nNEWS HIGHLIGHTS\n\n\n\nTransaction will accelerate innovation of critical multi-beam mask writing tools and foster deeper cross-industry collaboration.\n\n\n\nMulti-beam mask writing tools are critical to the semiconductor ecosystem for creating EUV technology.\n\n\n\nSale of approximately 20% stake values IMS at approximately $4.3 billion.\n\n\n\n SANTA CLARA, Calif. & BOSTON--(BUSINESS WIRE)--\nIntel Corporation today announced that it has agreed to sell an approximately 20% stake in its IMS Nanofabrication GmbH (“IMS”) business to Bain Capital Special Situations (“Bain Capital”), in a transaction that values IMS at approximately $4.3 billion. The transaction is expected to close in the third quarter of 2023. IMS will operate as a standalone subsidiary and will continue to be led by CEO Dr. Elmar Platzgummer.\n\n\nSince inventing multi e-beam technology and introducing the first commercial multi-beam mask writer in 2015, Vienna, Austria-based IMS has been an industry leader in multi-beam mask writing for advanced technology nodes. Intel initially invested in IMS in 2009 and ultimately acquired the business in 2015. Since the acquisition, IMS has delivered a significant return on investment to Intel while growing its workforce and production capacity by four times and delivering three additional product generations. \n\n\nToday, as EUV technology becomes broadly adopted in leading-edge technologies, the multi-beam mask writing tools required to create advanced EUV (extreme ultraviolet lithography) masks are increasingly critical components to the semiconductor manufacturing ecosystem. This investment will position IMS to capture the significant market opportunity for multi-beam mask writing tools by accelerating innovation and enabling deeper cross-industry collaboration.\n\n\n“The advancement of lithography is critical to driving continued progress in the semiconductor industry, and mask writing plays a central role in the industry’s transition to new patterning technologies, such as high-NA EUV,” said Matt Poirier, senior vice president of Corporate Development at Intel. “Bain Capital’s investment and partnership will provide IMS with increased independence and bring strategic perspective to hel...

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