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DuPont Innovators in Semiconductor Materials Named 2025 Heroes of Chemistry
DuPont (NYSE: DD) today announced that 13 of its current and former scientists and engineers have been named 2025 Heroes of Chemistry by the American Chemical Society (ACS) for an innovative program that progressed semiconductor lithography.
About this update from Dupont De Nemours, Inc.
[{"type":"text","content":"Breakthrough in Semiconductor Lithography Recognized by the American Chemical Society","length":85,"tagName":"p"},{"type":"text","content":"WILMINGTON, Del., June 10, 2025 /PRNewswire/ -- DuPont (NYSE: DD) today announced that 13 of its current and former scientists and engineers have been named 2025 Heroes of Chemistry by the American Chemical Society (ACS) for an innovative program that progressed semiconductor lithography.","length":309,"tagName":"p"},{"type":"image","alt":"DuPont Logo (PRNewsfoto/DuPont)","displaySize":"","headline":null,"caption":"DuPont Logo (PRNewsfoto/DuPont)","className":"","disableSlideshowImg":false,"size":{"original":{"width":400,"height":116,"url":"https://media.zenfs.com/en/prnewswire.com/2afc4d09101aeb9068e83f4cbae39368"},"resized":{"url":"https://s.yimg.com/ny/api/res/1.2/zbYf18RI2ZQcA3.f03pEoA--/YXBwaWQ9aGlnaGxhbmRlcjt3PTcwNTtoPTIwNDtjZj13ZWJw/https://media.zenfs.com/en/prnewswire.com/2afc4d09101aeb9068e83f4cbae39368","width":400,"height":116}},"href":"https://mma.prnewswire.com/media/1167395/dupont_Logo.html","hrefExternal":true,"rel":"nofollow"},{"type":"text","content":"The award recognizes the collaborative development of embedded barrier layer technology, a transformative advancement in 193 nm immersion lithography that significantly improved chip fabrication processes by increasing yield, reducing defects, and enhancing process efficiency. The honored team includes Deyan Wang, Ph.D., Cong Liu, Ph.D., Doris Kang, Ph.D., MingQi Li, Ph.D., Shintaro Yamada, Ph.D., Stefan Caporale, Chengbai Xu, Ph.D., George Barclay, Ph.D., ChunYi Wu, Joon Seok Oh, Li Jia, Jinrong Liu, and Anthony Zampini.","length":532,"tagName":"p"},{"type":"text","content":"Formulations containing embedded barrier technology have been widely adopted in lithography processes across the global semiconductor industry, supporting advancements for technologies such as artificial intelligence (AI), advanced computing and consumer electronics.","length":267,"tagName":"p"},{"type":"text","content":"Embedded barrier layer technology addresses key challenges in early immersion lithography such as defectivity and process stability. By integrating barrier functionality directly into the photoresist, fabricators can simplify their lithography processes, with lower materials usage and reduced energy consumption. T...