Business

Asahi Kasei Launches New Series of Sunfort™ Dry Film Photoresist as Material for Back-End Processing of Advanced Semiconductor Packaging Used in AI Servers

TOKYO & NOVI, Mich. & DÜSSELDORF, Germany, May 28, 2025--Asahi Kasei has developed the TA Series of Sunfort™ dry film photoresist for advanced semiconductor packages.

articleAsahi Kasei CorporationMay 28, 20254/company/asahi-kasei-corporation/news/asahi-kasei-launches-new-series-of-sunforttm-dry-film-photoresist-as-material-for-back-end-processing-of-advanced-semiconductor-packaging-used-in-ai-servers
Asahi Kasei Launches New Series of Sunfort™ Dry Film Photoresist as Material for Back-End Processing of Advanced Semiconductor Packaging Used in AI Servers

About this update from Asahi Kasei Corporation

[{"type":"image","alt":"Sunfort™ dry film photoresist","displaySize":"","headline":null,"caption":"Sunfort™ dry film photoresist","credit":null,"className":"","disableSlideshowImg":false,"size":{"original":{"width":480,"height":321,"url":"https://media.zenfs.com/en/business-wire.com/554edb8c235a2f97296591cadca51fbc"},"resized":{"url":"https://s.yimg.com/ny/api/res/1.2/UUI5H0N6wwiZKmAgNVM9Fw--/YXBwaWQ9aGlnaGxhbmRlcjt3PTk2MDtoPTY0MjtjZj13ZWJw/https://media.zenfs.com/en/business-wire.com/554edb8c235a2f97296591cadca51fbc","width":480,"height":321}},"lazy":false},{"type":"image","alt":"Micro-pattern of 7 µm thick TA Series formed by LDI; (a) Resist pattern (L/S = 1.0/3.0 µm; L/S = Line / Space in micro-wiring [µm]) front side; (b) Resist pattern (L/S = 1.0/3.0 µm) oblique; (c) Pattern cross section after resist stripping (Plating line width / Space width = 3.0/1.0 µm)","displaySize":"","headline":null,"caption":"Micro-pattern of 7 µm thick TA Series formed by LDI; (a) Resist pattern (L/S = 1.0/3.0 µm; L/S = Line / Space in micro-wiring [µm]) front side; (b) Resist pattern (L/S = 1.0/3.0 µm) oblique; (c) Pattern cross section after resist stripping (Plating line width / Space width = 3.0/1.0 µm)","credit":null,"className":"","disableSlideshowImg":false,"size":{"original":{"width":480,"height":371,"url":"https://media.zenfs.com/en/business-wire.com/00270505d23ae466731c75c67d0721cf"},"resized":{"url":"https://s.yimg.com/ny/api/res/1.2/RXvzCVq6akObafdFtfL2nw--/YXBwaWQ9aGlnaGxhbmRlcjt3PTk2MDtoPTc0MjtjZj13ZWJw/https://media.zenfs.com/en/business-wire.com/00270505d23ae466731c75c67d0721cf","width":480,"height":371}}},{"type":"image","alt":"","displaySize":"","headline":null,"caption":"","credit":null,"className":"","disableSlideshowImg":false,"size":{"original":{"width":4999,"height":683,"url":"https://media.zenfs.com/en/business-wire.com/00bd3a6893c2b09d134293d35c326465"},"resized":{"url":"https://s.yimg.com/ny/api/res/1.2/tGujedm788EKQ.Iz_EgFIA--/YXBwaWQ9aGlnaGxhbmRlcjt3PTk2MDtoPTEzMTtjZj13ZWJw/https://media.zenfs.com/en/business-wire.com/00bd3a6893c2b09d134293d35c326465","width":960,"height":131},"lightbox":{"url":"https://s.yimg.com/ny/api/res/1.2/XaZpHHVLRqXPfIIYe2V3vA--/YXBwaWQ9aGlnaGxhbmRlcjt3PTI0MDA7aD0zMjg7Y2Y9d2VicA--/https://media.zenfs.com/en/business-wire.com/00bd3a6893c2b09d134293d35c326465","width":1200,"height":164}}},...

More updates from Asahi Kasei Corporation

Asahi Kaseidry film photoresistLDI