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Advanced Energy to Introduce Three New Process Power Products During SEMICON West 2020
AE announces a revolutionary plasma process power system and expands the capabilities of its leading solid-state match and integrated RF generator and match
About this update from Advanced Energy Industries, Inc.
[{"type":"text","content":"\nAE announces a revolutionary plasma process power system and expands the capabilities of its leading solid-state match and integrated RF generator and match solution\n\n DENVER--(BUSINESS WIRE)--\nAdvanced Energy (Nasdaq: AEIS) – a global leader in highly engineered, precision power conversion, measurement and control solutions – today announced it will unveil three new solutions for advanced technology node semiconductor wafer processing during the SEMICON® West 2020 virtual conference taking place July 20 to 23.\nThis press release features multimedia. View the full release here: https://www.businesswire.com/news/home/20200720005197/en/Advanced Energy's eVoS™ LE platform (Photo: Business Wire)\n\n“Semiconductor manufacturing is growing and rapidly transforming with the rise of the 4th Industrial Revolution. AE is at the forefront with power solutions that enable smaller features, faster processes, tighter control and lower cost of ownership, which our customers rely on to make the chips that fuel the data economy,” said Peter Gillespie, vice president and general manager, semiconductor, Advanced Energy. “Formerly almost hidden from view, process power is now increasingly recognized as a critical enabler in wafer processing. We look forward to sharing our products that ‘power the process’ as well as exhibiting, for the first time, products that ‘power the platform’ with AE’s Artesyn Embedded Power portfolio of offerings.”\n\n\nAE will introduce valuable new system solutions that change how plasma processes are powered:\n\n\neVoS™ LE: AE introduces its eVoS platform, a wholly new non-sinusoidal plasma power technology that enables tightly targeted ion energy control, which is increasingly important for advanced etch and deposition processes used to create leading-edge device features at 5nm and below. Providing an alternative to conventional sinusoidal RF bias plasma power that uses complex multi-frequency systems, eVoS is designed to produce customized narrow ion energy distributions in a singular solution. AE’s solution enables more direct control of ion energy distributions, better bias power efficiency and less power loss than conventional solutions, all benefits necessary to create increasingly challenging 3D IC features. eVoS LE (Low Energy) offers precise power control for critical plasma-based applications, such as ato...